The Story
Patented Worldwide. CCS Technology™ pads made exclusively for use on DA or Random Orbital machines. Thin and tapered design with exact fit backing for classically optimized performance.
BACKGROUND OF CCS TECHNOLOGY
Conventional foam pads gradually absorb compound and polish. This reduces polish and pad performance because most of the polish is trapped below the working surface of the pad. CCS technology™ solves this common problem using strategic patterns of partially closed foam cells.
Benefits:
- Slow Rate of Polish Absorption – CCS pockets gradually release polish as needed by the operator.
- Prevents Pad Skipping – CCS pockets reduce surface tension allowing operator to run pad flat on working surface.
- Creates Less Heat – CCS pockets reduce surface contact resulting in less friction generated heat.
Details & Craftsmanship
Every detail has been carefully considered to bring you the perfect product.
Details & Craftsmanship
Every detail has been carefully considered to bring you the perfect product.
Description
Patented Worldwide. CCS Technology™ pads made exclusively for use on DA or Random Orbital machines. Thin and tapered design with exact fit backing for classically optimized performance.
BACKGROUND OF CCS TECHNOLOGY
Conventional foam pads gradually absorb compound and polish. This reduces polish and pad performance because most of the polish is trapped below the working surface of the pad. CCS technology™ solves this common problem using strategic patterns of partially closed foam cells.
Benefits:
- Slow Rate of Polish Absorption – CCS pockets gradually release polish as needed by the operator.
- Prevents Pad Skipping – CCS pockets reduce surface tension allowing operator to run pad flat on working surface.
- Creates Less Heat – CCS pockets reduce surface contact resulting in less friction generated heat.
